000 01406cam a22004097i 4500
001 18386638
003 OSt
005 20210930191936.0
008 141125s2014 maua d 001 0 eng d
010 _a 2014469441
015 _aGBB0A4559
_2bnb
016 7 _a015639217
_2Uk
020 _a9780815515937
020 _a0815515936
035 _a(OCoLC)ocn660539201
040 _aUKM
_beng
_erda
_cUKM
_dBTCTA
_dYDXCP
_dIQU
_dDLC
042 _alccopycat
050 0 0 _aTS695
_b.S275 2014
082 0 4 _a621.381
_222
100 1 _aSarkar, Jaydeep
_c(Materials scientist)
245 1 0 _aSputtering materials for VLSI and thin film devices /
_cJaydeep Sarkar.
264 1 _aWaltham [Mass.] :
_bWilliam Andrew,
_c2014.
300 _ax, 603 pages :
_billustrations ;
_c25 cm
336 _atext
_btxt
_2rdacontent
337 _aunmediated
_bn
_2rdamedia
338 _avolume
_bnc
_2rdacarrier
504 _aIncludes bibliographical references and index.
650 0 _aMicroelectronics
_xMaterials.
650 0 _aCathode sputtering (Plating process)
_xMaterials.
650 0 _aIntegrated circuits
_xVery large scale integration
_xMaterials.
650 0 _aThin film devices
_xMaterials.
650 0 _aFlat panel displays
_xMaterials.
650 0 _aSputtering (Physics)
906 _a7
_bcbc
_ccopycat
_d2
_encip
_f20
_gy-gencatlg
942 _2lcc
_cBK
999 _c2142
_d2142